(Nikkei BP Group)
(No.1 High-Tech News Site in Japanese)
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| Nikon Releases Stepper for 0.18-0.15 Micron Rule ICs
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December 4, 1998 (TOKYO) -- Nikon Corp. displayed a step-and-repeat (stepper)
scanning system for 0.18-0.15 micron design rule microchips at the SEMICON
Japan 98, a semiconductor manufacturing equipment and material exhibition,
held through Dec. 4.
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Its NSR-S203B stepper will go on sale at the end of December. Among similar
products for 0.18-0.15 micron design rule, Canon Inc. is already selling
a model with the numerical aperture (NA) of 0.68 and ASM Lithography
of the Netherlands is marketing a machine with an NA of 0.70.
Nikon, Japan's largest manufacturer of stepper systems, is following
suit.
With new scanning-type stepper product lines being presented by leading
manufacturers, the market appears to be converging on scanning steppers
featuring NA levels of 0.68-0.70.
The alignment accuracy of Nikon's new machine is 40nm, with a throughput
of 85 wafers an hour (of 200mm wafers). The area of exposure is 25mm
x 33mm.
Nikon's new machine can be used for 200mm wafers as well as 300mm wafers.
The price is about 850 million yen (US$6.9 million), according to Nikon.
Related story: SEMICON
Japan 98 Attracts Record Number of Participants
(Nikkei
Microdevices)
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