(Nikkei BP Group)
(No.1 High-Tech News Site in Japanese)
| Nikon Releases Stepper for 0.18-0.15 Micron Rule ICs
December 4, 1998 (TOKYO) -- Nikon Corp. displayed a step-and-repeat (stepper)
scanning system for 0.18-0.15 micron design rule microchips at the SEMICON
Japan 98, a semiconductor manufacturing equipment and material exhibition,
held through Dec. 4.
|Its NSR-S203B stepper will go on sale at the end of December. Among similar
products for 0.18-0.15 micron design rule, Canon Inc. is already selling
a model with the numerical aperture (NA) of 0.68 and ASM Lithography
of the Netherlands is marketing a machine with an NA of 0.70.
Nikon, Japan's largest manufacturer of stepper systems, is following
With new scanning-type stepper product lines being presented by leading
manufacturers, the market appears to be converging on scanning steppers
featuring NA levels of 0.68-0.70.
The alignment accuracy of Nikon's new machine is 40nm, with a throughput
of 85 wafers an hour (of 200mm wafers). The area of exposure is 25mm
Nikon's new machine can be used for 200mm wafers as well as 300mm wafers.
The price is about 850 million yen (US$6.9 million), according to Nikon.
Related story: SEMICON
Japan 98 Attracts Record Number of Participants
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