(Japanese Site)
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| Hitachi Markets Microscope for 0.10-0.13 Micron ICs
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March 12, 1998 (TOKYO) -- Hitachi Ltd. developed the HD-2000 microscopic instrument to view
0.10-0.13 micronmeter rule microchips or integrated circuits.
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The new instrument reportedly makes it as easy to see those parts as does a scanning electron
microscope (SEM).
To date, it has been necessary to use a transmission electron microscope (TEM) to observe such
a thin film. Sample preparation for the TEM, however, has been so difficult that a specialized
technician needed to do it.
The new instrument is easy enough for a wafer process engineer to use, Hitachi officials said.
The new instrument provides transmitted electrons to observe the thin film, irradiating the
sample with a sharpened electron beam. Unlike TEM, in which the sample has to be irradiated
broadly with electron beams, the electron-beam intensity can easily be increased to be free
from the preparation of thin films that was required for TEM observation.
TEM uses a fluorescent plate to produce a transmitted electron image. The present instrument
uses a high-sensitive detector to provide electric signals of transmitted electrons.
Consequently, it is possible to fine-tune observations by watching a monitor screen, similar to
the procedure for a SEM.
Its resolution is 0.4nm, and magnification is 1-2,000,000. The maximum sample size is 4mm x
0.5mm x 0.3mm. The acceleration voltage is 200 kV. It is priced at 160 million yen (US$1.26
million).
More information is available in English at:
http://www.hitachi.co.jp/New/cnews/E/980303B.html
(Nikkei Microdevices)
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